| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b20477ace97383033869f68a282f2d44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_175bef6f8f48e8fda8cc57343a34747e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8381805eba6d034fc77bd230dd02e6e2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-30 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa2e1c949f31a4ad86a325ac582b7dcb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a84244d79943c2a4696eb2718f09b76 |
| publicationDate |
2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005090638-A2 |
| titleOfInvention |
Remote chamber methods for removing surface deposits |
| abstract |
The present invention relates to an improved remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a deposition chamber that is used in fabricating electronic devices. The improvement involves addition of a nitrogen source to the feeding gas mixture comprising of oxygen and fluorocarbon. The improvement also involves pretreatment of interior surface of the pathway from the remote chamber to the surface deposits by activating a pretreatment gas mixture comprising of nitrogen source and passing the activated pretreatment gas through the pathway. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10109496-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015103003-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022059327-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007070116-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007070116-A2 |
| priorityDate |
2004-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |