| abstract |
Disclosed is a method for producing a polymer which enables to form a film that can be suitably used, for example, as an interlayer insulating film in a semiconductor device, and has low relative dielectric constant, excellent mechanical strength and adhesiveness, and uniform film quality. Also disclosed are a polymer, a composition for forming an insulating film, a method for producing an insulating film and an insulating film. Specifically disclosed is a method for producing a polymer including hydrolysis-condensation of a silane monomer (B) containing a hydrolyzable group in the presence of a polycarbosilane (A) wherein the polycarbosilane (A) is a polymer (I) as defined below. A polymer (I) is obtained by reacting at least one compound selected from the group consisting of compounds (a) represented by the general formula (1) below, compounds (b) represented by the general formula (2) below and compounds (c) represented by the general formula (3) below in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal. R1kCX4-k (1) R2kSiY4-k (2) R3mY3-mSiCR4nX3-n (3) (In the formulae, R1-R4 may be the same or different and respectively represent a monovalent organic group or a hydrogen atom; X represents a halogen atom; Y represents a halogen atom or an alkoxy group; k represents an integer of 0-3; and m and n may be the same or different and respectively represent an integer of 0-2.) |