| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4871e9c5984dd476c9fa9457cc77724a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1544cb1b68a2fedd69e7a8bdf06776f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4a14ef511c024661e8ef1d0a54f36377
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_006c4519aac3236d65c88559582af776
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c40f99bb8025226a5ef6992bb92240f0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2004-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af45ec2d3007f5b5ae4431e1e942dc84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfe8c930321bd44be2ff5d2a5fadca76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8f94dc5f95ef9cd5bdd991e917b023f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07705792b8a4ab7f23e81fc1c42c67f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef78c71eeab8af55e2508cf937c8807 |
| publicationDate |
2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005066387-A1 |
| titleOfInvention |
Method for cleaning film-forming apparatuses |
| abstract |
To provide an efficient method for cleaning film-forming apparatuses in order to remove a ruthenium-type deposit residing on a constituent member of a film-forming apparatus after said apparatus has been used to form a film comprising ruthenium or solid ruthenium oxide, wherein at least the surface region of the ruthenium-type deposit comprises solid ruthenium oxide. A ruthenium-type deposit, at least the surface region of which is solid ruthenium oxide, is brought into contact with reducing gas that contains a reducing species comprising hydrogen or hydrogen radical and the solid ruthenium oxide is thereby converted into ruthenium metal. This ruthenium metal is subsequently converted into volatile ruthenium oxide by bringing the ruthenium metal into contact with an oxidizing gas that contains an oxidizing species comprising an oxygenated compound, and this volatile ruthenium oxide is removed from the film-forming apparatus. |
| priorityDate |
2003-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |