| abstract |
A process for producing photonic crystals comprises (a) providing a photoreactive composition; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; and (c) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space. |