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filingDate 2004-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ee307fa72089e5c37bfb43db17be3cf
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publicationDate 2005-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2005043594-B1
titleOfInvention Method for forming photo-defined micro electrical contacts
abstract A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes (81) as one or more masks (73); a step for fabricating the plurality of probes using the mask (73); and disposing the plurality of probes (81) through corresponding holes in a first die (42) and a second die (44). The step for fabricating the plurality of probes (81) may include one of photo-etching and photo-defined electroforming.
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