http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005026409-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bcbcfb0fc9f692a98239e7c79a96b656 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72d118f5664072de841f9c5c34b9d99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_12c24381d759c77414181206644ec40a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59cbaba3383bc197ddbf00eed61baa09 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2004-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_583d080bd45ab5d1ee93be44e04fe05e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55b4dec0878b07887b79a1296d407928 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19e51bcc2abca83ffea08c013db0a5ec |
| publicationDate | 2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2005026409-A2 |
| titleOfInvention | Replaceable plate expanded thermal plasma apparatus and method |
| abstract | A deposition process comprises determining a target process condition within a chamber of an expanding thermal plasma generator (102, 202) for plasma enhanced chemical vapor deposition of a coating on a substrate; the generator (102, 202) comprising a cathode (106, 206), replaceable cascade plate and generators (108, 208) with concentric orifice; and replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition; and generating a plasma at the target process condition by providing a plasma gas to the plasma generator (102, 202) and ionizing the plasma gas in an arc between cathode (106, 206) and generators (108, 208) within the generator (102, 202) and expanding the gas as a plasma onto a substrate in a deposition chamber. A deposition apparatus (100) for generating a controllable plasma; comprises a deposition chamber; adapted to be maintained at subatmospheric pressure; an article support within the deposition chamber; an expanding thermal plasma generator (102, 202) comprising a cathode (106, 206), a single cascade plate and an generators (108, 208) and a communicating orifice through the cascade plate, the orifice having a length of lmm to less than 20mm. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113382525-A |
| priorityDate | 2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.