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filingDate 2004-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0078b10de7a392a29063d39e581b721
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publicationDate 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2005021173-A1
titleOfInvention Method of cleaning substrate processing chamber components having textured surfaces
abstract A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodge substantially all the particles from the textured surface. The method can be applied to dislodge grit particles from textured exposed surfaces formed by electromagnetic energy beam scanning and grit blasting. The method can also be applied to remove loosely adhered coating particles from the textured surfaces of coated components.
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