| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_55dd969994a13877f680fa0eff3d3939
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bab1101a53e8679b6014a0224af0087b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d339757b60821379b7b1a342d527385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F236-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L47-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F236-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F236-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14ab7b1d1faa99d77e29ab4d8b3f4e2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19e72205288e580a1bdc39509e06ae9f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4acdabaf6f3df436b66ecc63835082b5 |
| publicationDate |
2005-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005019284-A1 |
| titleOfInvention |
Fluorocopolymer, process for producing the same, and resist composition containing the same |
| abstract |
A fluoropolymer which has functional groups and is highly transparent in a wide wavelength region; and a resist composition containing the fluoropolymer. The fluorocopolymer comprises: units derived from a fluorinated diene represented by the following formula (1) and formed by the cyclopolymerization of the monomer; and units derived from other monomer(s) and formed by the cyclopolymerization thereof or units derived from an acrylic monomer and formed by the polymerization thereof. The resist composition contains the fluorocopolymer as a base polymer. CF2=CFCH2CH(CH2C(CF3)2(OR1))CH2CH=CH2 (1) In the formula, R1 is hydrogen, C20 or lower alkyl optionally having etheric oxygen, C6 or lower alkoxycarbonyl, or CH2R2 (wherein R2 is C6 or lower alkoxycarbonyl). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006132287-A1 |
| priorityDate |
2003-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |