| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d99b5a37ca2eff256571716a47c7b998
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_319a7dffdb13a9292c43bd641729d973
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_068bd02968f0df46131a331ddcf56db3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2004-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3a1254add2644b7510a97e3873f2a0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f384ff5f7b6412674a43136c6db514df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d343ccc59e79567fede2bea77482da8 |
| publicationDate |
2005-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005016982-A1 |
| titleOfInvention |
Resin for resist, positive resist composition, and method of forming resist pattern |
| abstract |
A positive resist composition which has excellent resolution and a wide focal-depth range; a resin for resists which is for use in the positive resist composition; and a method of forming a resist pattern from the positive resist composition. The resin for resists comprises, as main components, structural units (a) derived from an α-(lower alkyl)acrylic ester. The structural units (a) comprise: structural units (a1) derived from an α-(lower alkyl)acrylic ester having an acid-dissociable dissolution-inhibitive group; and lactone-containing monocyclic groups. The structural units (a1) comprise structural units represented by the following general formula (a1-1) [wherein R is hydrogen or lower alkyl; and R11 is an acid-dissociable dissolution-inhibitive group which contains a monocyclic aliphatic hydrocarbon group and contains no polycyclic aliphatic hydrocarbon groups]. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9459535-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008050482-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010536977-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013164509-A |
| priorityDate |
2003-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |