http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005006351-A2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9e5d69cc6b8fd5af41715cafe21e9569
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
filingDate 2004-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_deb04e5274cf8f3cc06696019452dbe0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_839075c165a93a375ea3a6f6ffde6b06
publicationDate 2005-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2005006351-A2
titleOfInvention Apparatus for and method of continuous hts tape buffer layer deposition using large scale ion beam assisted deposition
abstract The present invention is a high-throughput ion beam assisted deposition (EBAD) system and method of utilizing such a system that enables continuous deposition of thin films such as the buffer layers of HTS tapes. The present invention includes a spool-to-spool feed system that translates a metal substrate tape through the EBAD system as the desired buffer layers are deposited atop the translating substrate tape using an e-beam evaporator assisted by an ion beam. The system further includes a control and monitor system to monitor and regulate all necessary system parameters. The present invention facilitates deposition of a high-quality film over a large area of translating substrate.
priorityDate 2003-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 24.