http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004109775-A2

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02458
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
filingDate 2004-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89b8a9b2f5ddf361525e639e9c114c6e
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publicationDate 2004-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004109775-A2
titleOfInvention Formation of highly dislocation free compound semiconductor on a lattice mismatched substrate
abstract A highly dislocation free compound semiconductor, e.g. AlxInyGa1-x-yN (0<x, y<1), is formed on a lattice mismatched substrate, 24 e.g. Si, by first depositing a polycrystalline buffer layer 22 on the substrate. An amorphous layer 28 is then created at the interface of the substrate and the polycrystalline buffer layer, e.g. through ion implantation. A monocrystalline template layer 30 of the compound semiconductor is then deposited on the buffer layer, and an epilayer 32 of the compound semiconductor is grown on the template layer. A compound semiconductor based device structure may be formed in the epilayer.
priorityDate 2003-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 24.