| abstract |
A method of applying a pattern on a topography (18) includes first applying a polymer film (10) to an elastomer member (14), such as PDMS, to form a pad (12). The pad (12) is then applied to a substrate having a varying topography (18) under pressure. The polymer film (1) is transferred to the substrate due to the plastic deformation of the polymer film (10) under pressure compared to the elastic deformation of the elastomer member (14) of the pad. Thus, upon removal of the pad (12) from the substrate, the elastic member (14) pulls away from the polymer layer (10) , thereby depositing the polymer layer (1) upon the substrate. |