| abstract |
It is the purpose of the present invention to provide filter cartridges which can suitably be utilized in purifying chemical fluids for treating the surface of an electronic device substrate to be used in the semiconductor industry, particularly fluids containing a basic compound such as ammonia and an ammonium salt, or hydrofluoric acid (HF). The filter cartridges relating to the present invention which are used in removing metallic impurities contained in a chemical fluid for treating the surface of an electronic device substrate by treating the chemical fluid, is characterized by having a filter material incorporated therein, into which functional groups compatible with the existing morphology of the metallic impurities to be removed are incorporated in compliance with the constituents of the chemical fluid to be treated and the types of the metallic impurities to be removed. |