| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cbb701478fb14f6664ccfeeb89844f0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_467eb575a8853600d88a918f13bf4ef6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9bf7ab9b076dc5d10a887213c8620fb0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5bc1354c8da969255f6ce097c625efff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba761e43f3b71e3f19779f6cdb7849ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46742137f7ddb2317d0fb30c7ecd880a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
| filingDate |
2004-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32b956256039199a10ab18fd53e0f288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6af463b2b793cc3bd4e24d2c3cce2074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc55be3e16a09ac0096d20e0e14219a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81b8664c476f9fcc4e825edfaae07f45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e878018f9a02426f425147b49f8e2ade |
| publicationDate |
2004-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004077160-A2 |
| titleOfInvention |
Method of controlling the differential dissolution rate of photoresist compositions |
| abstract |
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8114949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006160712-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8088875-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006104378-A |
| priorityDate |
2003-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |