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filingDate 2004-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004075258-A2
titleOfInvention Method for depositing a low-k material having a controlled thickness range
abstract A method for depositing, with controlled thickness and thickness non-uniformity, a layer of a low-k dielectric material using a chemical vapor deposition process (CVD), which deposits the material for a duration of time during part of the deposition at a higher pressure of reactant gas than during the remaining time of the deposition.
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