| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b46b0e9715f06ce50c58d9c55a2695f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_04f276d1de315ea21ea0040293d447d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a12b0be1b74901f556d1d1a9200529ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_35f7b56e1d36b3d5760d8a3547aac511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25be49b16a0a50870a8b89223cd793c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ce51f2939519b9a4a012af1cf98d996 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06 |
| filingDate |
2004-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe467461b8429b99f9eec5c64d61aa6e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecca5efeafe01626156e11ef2621cd41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc673ee1a3a1ce4c81c2c9aaf45ed173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8efa072b80f4ff42c05f3e2c7b75572d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_774fd776d6ec8bc2155de8ba3fa1b1bb |
| publicationDate |
2004-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004072149-A1 |
| titleOfInvention |
Method for the production of polymethylvinylsiloxane resins with recycling of volatile oligoorganosiloxanes |
| abstract |
The invention relates to the field of silicon resins, particularly polymethylvinylsiloxane resins. The invention more specifically relates to a method for the production of polymethylvinylsiloxane resins comprising at least two different types of siloxy motifs R3SiO1/2 (motif M) and SiO4/2 (motif Q, optionally Q<OH>), characterized in that said method comprises the following steps: a) production of a siloxane resin comprising motifs Q by acidic hydrolysis of a siloxane resin precursor, preferably an alkaline silicate; b) functionalization of the siloxane resine obtained in step a) with halogenosilanes in the presence of an apolar solvent, said functionalization generating sub-products including volatile oligosiloxanes (silox); c) recovery of silox produced in step b) in a solution in the apolar solvent; and d) rearrangement of the resin functionalized in step b) with the aid of a strong base in order to eliminate the silanols, also characterized in that at least one part of the silox produced during step b) and recovered in step c) are recycled. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100396714-C |
| priorityDate |
2003-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |