| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00722
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00711
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00689 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M1-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12Q1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2003-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca748b765b6b40d4dc56f533529485be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_292fb714a1a660d07c38f678a5605eab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b893b188e4c24ff5bf4416abbae3d24d |
| publicationDate |
2004-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004065635-A2 |
| titleOfInvention |
Laser exposure of photosensitive masks for dna microarray fabrication |
| abstract |
A method and apparatus for forming a polymer array on a substrate suitable for synthesizing polymer sequences. This includes forming an array, each location of the array having at least one strand end, forming photosensitive protection on the strand ends, and selectively scanning and modulating at least one energy beam to expose a pattern on the photosensitive protection. In some embodiments, the method further includes removing a protective group from selected strand ends based on the exposed pattern. The method then includes adding a predetermined one or more polymeric subunits to the deprotected strand ends. In some embodiments the photosensitive protection includes a layer of photoresist to cover the strand ends. Some embodiments use an ultra-violet laser. |
| priorityDate |
2002-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |