http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004061899-A2

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filingDate 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c961b5136dc42a9bb930f871a982641
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publicationDate 2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004061899-A2
titleOfInvention Monitoring material buildup on system components by optical emission
abstract A method and system are provided for monitoring material buildup on system components in a plasma processing system. The system components contain emitters that are capable of producing characteristic fluorescent light emission when exposed to a plasma. The method utilizes optical emission to monitor fluorescent light emission from the emitters for determining system component status. The method can evaluate material buildup on system components in a plasma, by monitoring fluorescent light emission from the emitters. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.
priorityDate 2002-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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