http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004061899-A2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c75d2f9c527d0cc85091e7819faecd3c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_633495f3167cc0034bb0867a78b2fcb9 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-64 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-64 |
filingDate | 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c961b5136dc42a9bb930f871a982641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f224369a6e8b7a4e4b46a7c2f14c0d95 |
publicationDate | 2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-2004061899-A2 |
titleOfInvention | Monitoring material buildup on system components by optical emission |
abstract | A method and system are provided for monitoring material buildup on system components in a plasma processing system. The system components contain emitters that are capable of producing characteristic fluorescent light emission when exposed to a plasma. The method utilizes optical emission to monitor fluorescent light emission from the emitters for determining system component status. The method can evaluate material buildup on system components in a plasma, by monitoring fluorescent light emission from the emitters. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners. |
priorityDate | 2002-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.