Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f78b4629c3e62039b004639ed1c6f3f0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bffd32e6073275f0cf64b9612b160764 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-815 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F- http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2003-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fb633b28ce094710b00087c9a805840 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90d46cca3bca597c902c4826ce197991 |
publicationDate |
2004-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2004037866-A3 |
titleOfInvention |
Photoresists containing sulfonamide component |
abstract |
Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilayer resist systems. In preferred aspects, the Si-polymer has both sulfonamide substitution as well as moieties that can provide contrast upon exposure to photogenerated acid. |
priorityDate |
2002-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |