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filingDate 2003-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fb633b28ce094710b00087c9a805840
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publicationDate 2004-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004037866-A3
titleOfInvention Photoresists containing sulfonamide component
abstract Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilayer resist systems. In preferred aspects, the Si-polymer has both sulfonamide substitution as well as moieties that can provide contrast upon exposure to photogenerated acid.
priorityDate 2002-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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