http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004037711-A2

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filingDate 2003-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d0658ec92d3dbec4a67cf29df81683a
publicationDate 2004-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004037711-A2
titleOfInvention Processes for hermetically packaging wafer level microscopic structures
abstract A process for hermetically packaging a microscopic structure including a MEMS device is provided. The process for the present invention includes the steps of depositing a capping layer of sacrificial material patterned by lithography over the microscopic structure supported on a substrate, depositing a support layer of a dielectric material patterned by lithography over the capping layer, providing a plurality of vias through the support layer by lithography, removing the capping layer via wet etching to leave the support layer intact in the form of a shell having a cavity occupied by the microscopic structure, depositing a metal layer over the capping layer that is thick enough to provide a barrier against gas permeation, but thin enough to leave the vias open, and selectively applying under high vacuum a laser beam to the metal proximate each via for a sufficient period of time to melt the metal for sealing the via.
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