http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004032192-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
| filingDate | 2003-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86eeef86ce8a61fe4fc7456e8f03bfea |
| publicationDate | 2004-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2004032192-A2 |
| titleOfInvention | Composition and chemical vapor deposition method for forming organic low k dielectric films |
| abstract | Precursor compositions for the CVD formation of low k dielectric films on a substrate, e.g., as an interlayer dielectric material (34) for fabrication of microelectronic device structures. The precursor composition includes a gaseous mixture (14) of (i) at least one aromatic compound, (ii) an inert carrier medium and (iii) optionally at least one unsaturated constituent that is ethylenically and/or acetylenically unsaturated. The unsaturated constituent can include either (a) a compound containing ethylenic unsaturation and/or acetylenic unsaturation, or (b) an ethylenically unsaturated and/or acetylenically unsaturated moiety of the aromatic compound (i) of the precursor composition. The low k dielectric film material may be usefully employed in integrated circuitry utilizing copper metallization, to achieve low RC time constants and superior microelectronic device performance. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7901952-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7795153-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005092521-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7910013-B2 |
| priorityDate | 2002-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.