http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004027847-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_69a758895ccecb2166f9df7645c18cb0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89af0bde61ee35284d4fafcb598f1f67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0fd605903581ac32f4d750155c2b6d54 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2003-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71889308313b254378a734606acea8a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02ddb58078c05e45a197e6b95ba7c875 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67660733d3a175101064a050eaeff8e7 |
| publicationDate | 2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2004027847-A1 |
| titleOfInvention | Method of introducing impurity, device and element |
| abstract | A method of introducing an impurity wherein a shallow impurity layer can be formed easily; an impurity introduction device; and an element produced thereby. In these impurity introducing method and impurity introduction device, when it is intended to introduce a substance in a solid base having a film of, for example, an oxide attached to a surface thereof, the film of, for example, an oxide is removed by at least one means selected from the group consisting of means for irradiating the solid base surface with plasma, means for exposing the solid base surface to a gas and means for immersing the solid base surface in a reducing liquid before effecting attachment or introduction of desired particles. The method of attaching or introducing desired particles comprises bringing the solid base surface having the film of, for example, an oxide detached therefrom into contact with a gas containing desired particles so as to effect attachment to or introduction in the solid base surface or vicinity thereof. Elements are produced by the above impurity introducing method or impurity introduction device. |
| priorityDate | 2002-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.