| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_abd0e1a7fe6175a580ea5976bcb918f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2003-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77c6dff729fcdc57ed64f979190191d5 |
| publicationDate |
2004-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004008517-A1 |
| titleOfInvention |
Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film |
| abstract |
An insulating organic polymer film suitable for an interlayer dielectric film, which separates a multilayer copper interconnect of a semiconductor device, having an excellent mechanical strength and adhesion at the interface with an inorganic dielectric film lying as a lower or upper layer and a low effective relative dielectric constant as the entire film. An organic siloxane copolymer film is produced by polymerizing a cyclic siloziane and a straight-chain siloxane, which are used as raw materials, by plasma excitation. The organic siloxane copolymer film has a film composition principally formed of the straight-chain siloxane component at the interface with an inorganic dielectric film, thereby constituting a dense interfacial layer having a film property of excellent adhesion. The organic siloxane copolymer film has therein a layer containing a cycle siloxyane component where voids surrounded by a cyclic siloxne skeleton are and present and a straight-chain siloxane component and has a network structure with a relatively reduced density Accordingly, such a copolymer film has a composition changing in the direction of film thickness, and a multilayer interconnect is formed by embedding a copper film thereinto. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7968471-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010068375-A1 |
| priorityDate |
2002-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |