http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03090792-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_edf3823f6aac1a9d0aea1f294f72e86f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B2203-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2202-24 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F1-00 |
| filingDate | 2003-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eaa4c1fb9b91a91bbe35424edcceb1b0 |
| publicationDate | 2003-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-03090792-A2 |
| titleOfInvention | Method and apparatus for treating a substrate with an ozone-solvent solution iii |
| abstract | A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and heating either the ozone-water solution or the material to be treated or both, the ozone-solvent solution and the material to be oxidized with a point-of-use heater to quickly increase the temperature to a predetermined higher temperature T2-T1, and applying the ozone-solvent solution to said material(s) whereby the heated ozone-water solution will have a much higher dissolved ozone concentration at said higher temperature, than could be achieved if the ozone gas was initially dissolved in water at said higher temperature. The liquid back-pressure regulator (158) is positioned downstream of drain outlet port (52) of materials processing module (50) and gas back-pressure regulator (180) is placed downstream of gas outlet port (62), either upstream of catalytic unit (64) or downstream of catalytic unit (64) as shown in this example. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004036620-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004036620-A3 |
| priorityDate | 2002-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.