| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3143
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3211 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66765
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2003-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0fd721c867444419e76a474a54465d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4729f717ab4272333cc9b7aa93e17061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_620122497948d2d5067e767333092382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd33e2f38367ac51247f41fb510c71f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c4f51ab5312a3b628065baa5ccc5a34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eee14016755ed38cedb16939694a43e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4808bbc23c2ab11f903d10cfe653dada
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f71078e27a81662582c068c2ec727f7e |
| publicationDate |
2003-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-03083170-A1 |
| titleOfInvention |
Cvd method using pulsed gas flow |
| abstract |
A method of film layer deposition is described. A film layer is deposited using a cyclical deposition process. The cyclical deposition process consists essentially of a continuous flow of one or more process gases and the alternate pulsing of a precursor and energy to form a film on a substrate structure. |
| priorityDate |
2002-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |