| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fe12712279bf8c7bfb16ea2bbe5ca08b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-2224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N30-6095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0376
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L3-5027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00934
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00783
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00864 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01F25-4323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01F33-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01F25-4317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01F25-431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N30-6078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00071 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01L3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N30-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01F13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01F5-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00 |
| filingDate |
2003-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a9b18b1b9c33fa01df0e47256214084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec89277ff3e1a58f4bd7d29b5112dd15 |
| publicationDate |
2003-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-03068672-A2 |
| titleOfInvention |
Fabrication of ultra-shallow channels for microfluidic devices and systems |
| abstract |
A method for etching an ultra-shallow channel includes using an etch process that is selective for one material with minimum etching of a different material in order to achieve a very precise channel depth in the different material. Channels as shallow as 10nm can be fabricated in silicon with precisions of 5nm or better using the method. Stepped channels can be fabricated where each segment is a different depth, with the segments being between 10nm and 1000nm in depth. The method is applied to creat a fluidic channel which includes a channel substrate to which is bonded a lid substrate to confine fluids to the fluidic channels so fabricated. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9404913-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8815177-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114682314-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007043963-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8585916-B2 |
| priorityDate |
2002-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |