Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_105cf5f53977d46ed1709040e745d953 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_27be1f246daa1942ba00b8cd61d4ed66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a8bbb3dfa6edcf808848ea79743da16 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A62D2101-02 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A62D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-20 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A62D101-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A62D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-20 |
filingDate |
2002-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff3cb48a625cd05c0b1d5d69009015e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c9f8265adb7eccec095ac0e9617880 |
publicationDate |
2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-03059401-A3 |
titleOfInvention |
The use of high-purity chlorine dioxide gas to inactivate finely milled, humidification-resistant 'weaponized' spores |
abstract |
Weaponized spores are inactivated by subjecting the spores to humidification to both satisfy water up-take of any fillers present with the spores and humidify the spores, followed by sterilization with chlorine dioxide. |
priorityDate |
2001-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |