| abstract |
A novel developing solution for photoresists which is suitable for use as a developing solution for a photoresist formed on an aluminum-containing base formed on a wafer. It comprises an alkali builder, a calcium compound, and a chelating agent, the chelating agent being selected from the group consisting of 1-hydroxyethylidene-1,1-diphosphonic acid, aminotrimethylenephosphonic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, ethylenediaminetetramethylenephosphonic acid, diethylenetriaminepentamethylenephosphonic acid, hexamethylenediaminetetramethylenephosphonic acid, and diethylenetriaminepenta(methylenephosphonic acid). |