| abstract |
A MgO vapor deposition material, wherein it is a polycrystalline material having a MgO purity of 99.0 % or higher, a relative density of 90.0 % or more, a sulfur content of 0.01 to 50 ppm, a chlorine content of 0.01 to 50 ppm, a nitrogen content of 0.01 to 200 ppm, a phosphorus content of 0.01 to 30 ppm. The vapor deposition material allows the achievement of the vapor deposition almost free from the occurrence of splash phenomenon by the electron beam deposition method and also the preparation of a MgO film having improved film characteristics. |