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publicationDate 2003-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-03027021-A2
titleOfInvention Fluid treatment apparatus comprising doped semiconductor material
abstract A fluid treatment apparatus comprises a surface (15) which is coated with a photo catalytic oxidising semiconductor doped with a metal. The metal doping increases the life of electron hole pairs which are generated when the photo catalytic oxidising semiconductor is irradiated with light having a wavelength in the UV range. These electron hole pairs produce hydroxyls and oxygen free radicals (22). Hydroxyls and oxygen free radicals (22) are highly reactive and will break down complex molecules and, in the case of micro-organisms, will destroy them by attacking and breaching their cell walls.
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