| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31691
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02197
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2002-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20b9ee064c178aa2e93c7fec7f020b50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_462001d1c4f42edc13c8fae5cdc219a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5acd571dffe906d66a14d5d0fbc5210 |
| publicationDate |
2003-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-03006707-A1 |
| titleOfInvention |
Method for bst deposition by cvd |
| abstract |
A multiple-step CVD process for producing thin metal-oxide films is disclosed. The process involves the use of the same and/or a different mixture of precursor gases and/or the same and/or different precursor flows for each step. The multiple-step process yields more precise control over film stoichiometry. Also disclosed is a film having superior film quality. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1662556-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1662556-A1 |
| priorityDate |
2001-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |