| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2001-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dcaf2e41aae10e9b79738c410a8afc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7c9f34de12969c5f3eca8e5864a066f |
| publicationDate |
2003-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-03001294-A1 |
| titleOfInvention |
Resist compositions with polymers having 2-cyano acrylic monomer |
| abstract |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are develop able to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano arylic monomer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7632623-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1835343-A1 |
| priorityDate |
2001-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |