http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02088794-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-1221 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-13 |
| filingDate | 2002-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6029a4db29815bef76078084c5703ef9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32a6fde06def8cfeddeefa83afd72cf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acc1e0fd5786bbe49347210ed11e1041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43d71ecdcb9e832835ea89304b305c65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9321ae1293e7387d461443ce2dfb94b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6920c6e06aec2341469c3274c045954a |
| publicationDate | 2002-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-02088794-A1 |
| titleOfInvention | Polymer waveguide fabrication process |
| abstract | The invention relates to a process a process for forming single-mode, organic waveguides employing organic polymeric materials. The process reduces dissolved and gaseous oxygen content to very low quantities, resulting in production of waveguides having superior properties and manufacturability. Also provided is a process for preventing loss of light due to cores having flared ends. A waveguide is produced by sequentially a layer of a liquid, photosensitive buffer and clad composition to a surface of a substrate; deoxygenating under vacuum; overall exposing under an inert gas actinic radiation to partially polymerize the compositions below a full curing. Coating a photosensitive core composition to the clad composition; deoxygenating under vacuum, covering with an inert gas atmosphere; positioning a photomask above, but not in contact with the core layer; imagewise exposing the core through a photomask pattern to actinic radiation to partially polymerize the core composition; developing core; coating a photosensitive overclad composition over the image areas of the core composition; deoxygenating under vacuum; overall exposing the overclad composition, under inert gas to actinic radiation to substantially fully cure the optional buffer composition, the underclad composition, the core composition and the clad composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1550888-A1 |
| priorityDate | 2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 92.