http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02086196-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a84c0e39410647c5f8ed646ebf39a8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b794f3bd1b81e09708895550ee98a590
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb238d59ed710787a0ecdbb3ce8929a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_95a734cd9e93dcf3bffeafff8e54ff73
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
filingDate 2002-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5392d116629b652c1291af137b18ae29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c4adc68e0d43931b4f2c95d966d798e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4fabf4cb590ed68179f21ee445789e9
publicationDate 2002-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-02086196-A1
titleOfInvention Copper acid baths, system and method for electroplating high aspect ratio substrates
abstract Electroplating baths, system and method for electroplating copper on a substrate (240) having high aspect ratio confirmations thereon and a photoresist deposited on portions of the substrate are disclosed. The substrate (240) is immersed in a copper electrode (230) plating system (200). The system (200) comprises a container (220) adapted to hold an electrolytic bath (210) having acidic pH. The electroplating baths, systems and method offer enhanced throwing power through employing an acidic bath and plating additives disclosed herein.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014322912-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105745336-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105745336-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006032346-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9526183-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2514856-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013264214-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9445510-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9613858-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103484902-A
priorityDate 2001-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5849171-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6113771-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4923576-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4384930-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5976341-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2841573
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1474
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128038872
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129443877
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74791
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129157877

Total number of triples: 42.