http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02066378-A3

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filingDate 2001-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_241a16c94eb11b401ef2c056d321f4af
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publicationDate 2003-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-02066378-A3
titleOfInvention Methods of producing substantially anatase-free titanium dioxide with silicon halide addition
abstract The present invention provides methods of producing substantially anatase-free titanium dioxide by mixing titanium tetrachloride with a silicon compound to form an admixture, and introducing the admixture and oxygen into a reaction zone to produce the substantially anatase-free titanium dioxide. The reaction zone has a pressure of greater than 55 psig.
priorityDate 2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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