Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3082cd39bb800686b9abbb8aa05c80b |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-346 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D13-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate |
2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63cd46a9c73924c833787276105029d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ee42d4171ff25e2f9d4dc8426f2585b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af4672f7ce34c085427262db520ac7f8 |
publicationDate |
2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-02057071-A2 |
titleOfInvention |
Catalytic reactive pad for metal cmp |
abstract |
A polishing pad including a polishing pad substrate and a catalyst having multiple oxidation states wherein the catalyst containing polishing pad is used in conjunction with an oxidizing agent to chemically mechanically polish metal features associated with integrated circuits and other electronic devices. |
priorityDate |
2001-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |