| abstract |
The invention provides a process by which a fluoropolymer capable of forming a coating film excellent in mechanical properties, solvent resistance and chemical resistance can be efficiently produced at a high polymerization rate without CFC or HCFC having high ozone depletion potential, specifically, a process for producing a fluoropolymer by polymerizing a monomer component containing a fluoroolefin in a polymerization medium, where the polymerization medium is a fluorine-containing solvent which has an ozone depletion potential of 0 and the solubility of hydroxybutyl vinyl ether in which is 0.5 % or above. |