| abstract |
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R?1 and R3¿ are each independently selected from H, OH, CO¿2?H, halogen, C1-C3 alkyl, C1-C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9-C16 alkyl, or C9-C16 alkoxy. |