| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd259bd52ec4f0e55779ba9b0d4a8819 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-2027 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J41-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J47-016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-1425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B7-191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J49-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J41-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J49-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J49-57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J49-60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J49-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J41-04 |
| filingDate |
2000-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c467ed730f3ff54c996939310a9f66b |
| publicationDate |
2001-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0140117-A1 |
| titleOfInvention |
Fluorine removal by ion exchange |
| abstract |
A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles. |
| priorityDate |
1999-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |