| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25bfb50ec8a2e2e6df4097df7e8a01d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1fd55c6d8cddfb95ddc8707666fc807c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H02S50-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-186 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2000-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7c46f18e9f02801dbbc4e98ce827e29 |
| publicationDate |
2001-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0126163-A1 |
| titleOfInvention |
Apparatus for localizing production errors in a photovoltaic element |
| abstract |
Apparatus for localizing production errors in a photovoltaic element which is formed substantially by a semiconductor substrate in the form of a wafer, on opposite main surfaces of which are arranged electrical conductors for transporting electrical charge carriers, comprising at least one first electrode in electrical contact with a first main surface of said substrate and displaceable over said substrate, a second electrode to be arranged in electrical contact with the conductors on the second main surface, displacing means for displacing the first electrode over said first main surface, voltage measuring means for measuring the voltage between the at least one first and the second electrode subject to the position of the first electrode on said first main surface, and adjusting means for adjusting a bias over the electrical conductors on the opposite main surfaces of said substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1758178-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102197311-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010023263-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2159583-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008129010-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7554346-B2 |
| priorityDate |
1999-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |