| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a492467862e8e7313960f51eb233a4a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-32 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2000-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee1830f44b6ee15c8c9fa8d57d2ec4a0 |
| publicationDate |
2000-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0067281-A1 |
| titleOfInvention |
Plasma etching |
| abstract |
Provided is a method of etching an etch layer (86) using a polycarbonate layer (88) as a mask. The method includes placing an etch structure (80) in a reaction chamber, the etch structure (80) including an etch layer (86) underlying the polycarbornate layer (88), the polycarbonate layer (88) having apertures (90). The etch layer (80) is then etched using a low-pressure high density plasma generated at a pressure in the range of approximately 1 to 30 millitorr where the ionized particle concentration is at least 1011 ions/cm3, and where the ionized particle concentration is substantially equal throughout the volume of the reaction chamber. To increase the etch rate, the etch structure (80) can be cooled or biased. To decrease the etch rate, an inert gas can be added to the process gas mixture used to form the plasma. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03021659-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7077973-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7018934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101119859-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6960413-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7521000-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7371485-B2 |
| priorityDate |
1999-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |