| abstract |
An organoruthenium compound and an organoplatinum compound with each of which a thin film can be deposited at a constant rate and which have excellent thermal stability. The organoruthenium compound has a cyclopentadiene ring, which is a five-membered ring, having as at least one substituent an alkyl group selected among CH2CH3, CH2CH2CH3, CH2CH2CH2CH3, C(CH3)3, CH2(C6H5), COCH3, COOCH3, and CH2OCH3. The platinum compound has a cyclopentadiene ring, which is a five-membered ring, having as at least one substituent an alkyl group selected among CH3, CH2CH3, CH2CH2CH3, CH2CH2CH2CH3, C(CH3)3, and CH2(C6H5). |