Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72d118f5664072de841f9c5c34b9d99 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B60J1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 |
filingDate |
2000-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b4851be07ab1f418fba96a14065366f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_519c74cc5c94f692a6b19d67cbda5641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03fee4b9ac1333f007d2456ee36f3d12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_221b9778a6393823f71921a9812d9c79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f9aad667cc14b9a1b308e2643643f8b |
publicationDate |
2000-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-0055388-A2 |
titleOfInvention |
Method and apparatus for arc deposition |
abstract |
A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant (12); introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate (20). This method is used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate (20). An apparatus (4) for depositing a UV filter coating on a polymeric substrate comprises a plasma generator (10) having an anode (19) and a cathode (13) to form a plasma, and a first inlet (12) for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate (20) by the plasma (50). Optionally, an injection nozzle (18) can be utilized to provide a controlled delivery of the first reactant into the plasma (50). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100912981-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2302423-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03038141-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03038141-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9702036-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7390573-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3374542-B1 |
priorityDate |
1999-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |