| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44e790773095b4235c508864445f9a12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ea7332f97a8d005a9a5ea995dbcceaf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b4e345b26926d925d95508b5f7e8b909
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e3830f35387a1c32061dea3ee310851 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01L5-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01L1-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C21-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C21-00 |
| filingDate |
2000-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b926464ed928f26f1a93de35b94db9da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6049847820013cdf42d0951e7941e7fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_369d685ddf6ad5bf5c1c363fd41b319b |
| publicationDate |
2001-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0047529-A9 |
| titleOfInvention |
Strengthening, crack arrest and multiple cracking in brittle materials using residual stresses |
| abstract |
Embodiments include a method for forming a glass which displays visible cracking prior to failure when subjected to predetermined stress level that is greater than a predetermined minimum stress level and less than a failure stress level. The method inlcudes determining a critical flaw size in the glass and introducing a residual stress profile to the glass so that a plurality of visible cracks are formed prior to failure when the glass is subjected to a stress that is greater than the minimum stress level and lower than the critical stress. One method for forming the residual stress profile includes performing a first ion exchange so that a first plurality of ions of a first element in the glass are exchanged with a second plurality of ions of a second element that have a larger volume than the first ions. A second ion exchange is also performed so that a plurality of the second ions in the glass are exchanged back to ions of the first element. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11785729-B2 |
| priorityDate |
1999-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |