| abstract |
A positively photosensitive resin composition exhibiting high sensitivity and a high resolving power and being capable of forming patterns which are free from scum and have good shapes. This composition contains a photosensitive novolak resin consisting of an ester of an alkali-soluble novolak resin with 1,2-naphthoquinonediazide-4-sulfonic acid and an ester thereof with 1,2-naphthoquinonediazide-5-sulfonic acid and characterized in that the weight ratio of 1,2-naphthoquinonediazide-4-sulfonyl to 1,2-naphthoquinonediazide-5-sulfonyl ranges from 5:95 to 20:80. |