Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d91b2f9432de1bcf3290473f7a3e96c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F261-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F261-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F261-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F261-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
1999-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0ff1d12fdf03de4548c6096fa505c4d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c3574260787ea4b2e452e122cfc1d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_635beca4e9e3126718f5fbdbcd83e59c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cff3dcbf7ec61f41ee498f790367ad6 |
publicationDate |
2000-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-0027891-A1 |
titleOfInvention |
Preparation of partially cross-linked polymers and their use in pattern formation |
abstract |
This invention relates to a process for generating an organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendent COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of an acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101192006-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101943862-A |
priorityDate |
1998-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |