| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad893b66c6105dfc9699a59fdc46602e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3a676435d6c519cd20694bc8d61ce4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f6ba69e6c6422e7c9b749ccc5a705ac5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8bd460962b55a25fd74ff53cc2e2eeb8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1025 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 |
| filingDate |
1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19f324eb946e313534de58d9bbc8caec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b33dddd794e212aaab3ca5cee493debc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b5ec5e58c066a7dca2a6c53191b2851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dff7277c5a0e2b0e0ad366400cd93f8b |
| publicationDate |
2000-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0014604-A1 |
| titleOfInvention |
Positive photosensitive resin precursor composition and process for producing the same |
| abstract |
A positive photosensitive resin precursor composition characterized by comprising (a) a polymer consisting mainly of structural units bonded to each other in the manner shown by general formula (1) and (b) a photo-acid generator, being capable of forming a pattern through light irradiation and subsequent development, and having a total carboxyl group content of 0.02 to 2.0 mmol per g of the polymer. It provides a photosensitive resin composition which is capable of alkali development and is highly sensitive. (R1 represents a tri- to octavalent C¿2+? organic group; R?2¿ represents a di- to hexavalent C¿2+? organic group; R?3¿ represents hydrogen or a C¿1-20? organic group; n is an integer of 3 to 100,000; m is 1 or 2; and p and q each is an integer of 0 to 4, provided that p+q⊃0). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02069041-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1296540-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1296540-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100840472-B1 |
| priorityDate |
1998-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |