| abstract |
This invention provides organocopper (I) compounds containing an acetoacetate derivative and an appropriate neutral ligand to form (R?6COOCR5COR4)Cu+1{L}¿x, where x is 1, 2 or 3 and L is a neutral ligand which is a phosphine, phosphite or an unsaturated hydrocarbon. Both R?4 and R6¿ are each independently C¿1?-C9 alkyl or aryl and R?5¿ is H, F, C¿1?-C9 alkyl or aryl. The advantages of using these organocopper (I) compounds as CVD precursors are high thermal stability, volatility and ability to deposit high-quality copper films using CVD techniques. These precursors were isolated as distillable liquids or low melting solids and are vaporized without decomposition to deposit copper selectively on a metallic or electrically conductive surfaces at low temperatures. |