http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-T892006-I4
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-109 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0384 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-54 |
| filingDate | 1970-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1971-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1971-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-T892006-I4 |
| titleOfInvention | Defensive publication |
| abstract | THERE ARE DISCLOSED LIGHT-SENSITIVE POLYESTER CONDENSATION PRODUCTS OF THE BIS(P-CARBOXYBENZYLIDENE)CYCLOALKANONES, OR THEIR ESTERS WITH ORGANIC DIOLS CONTAINING RECURRING GROUPS HAVING THE FORMULA WHEREIN R1 AND R2 ARE HYDROGEN ATOMS, OR TOGETHER REPRESENT THE ATOMS NECESSARY TO COMPLETE A CYCLOALKANONE RING HAVING 5 TO 8 CARBON ATOMS IN THE RING AND G IS THE RESIDUE REMAINING AFTER REMOVAL OF THE HYDROXYL GROUPS FROM AN ORGANIC DIOL. THESE POLYESTERS ARE OBTAINED BY REACTING A DIOL WITH A DIBENZYLIDENEALKANONE MONOMER HAVING THE FORMULA WHEREIN R1 AND R2 ARE AS DEFINED ABOVE AND R3: A HYDROGEN ATOM, A LOWER ALKYL GROUP OR AN ARYL GROUP. AN EXAMPLE OF SUCH A MONOMER DISCLOSED IS 2,5-DI(4-CARBOMETHOXYBENZYLIDENE)CYCLOPENTANONE HAVING THE FORMULA D R A W I N G THIS MONOMER IS OBTAINED BY THE REACTION OF METHYL 4FORMYLBENZOATE AND CYCLOPENTANONE. THERE IS DISCLOSED THE PREPARATION OF A LIGHT-SENSITIVE POLYESTER BY THE REACTION OF DIMETHYLISOPHATHALATE AND 2,5-DI(4-CARBOMETHOXYBENZYLIDENE)CYCLOPENTANONE WITH 1,4-(B-HYDROXYETHOXY)CYCLOHEXANE. THE LIGHT-SENSITIVE POLYESTERS ARE USEFUL IN PHOTO-MECHANICAL REPRODUCTION PROCESSES SUCH AS FOR LITHOGRAPHIC PURPOSE OR A PHOTO-RESISTS. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4684601-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4591545-A |
| priorityDate | 1970-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.