| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2438-01 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G64-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D187-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G64-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G81-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D169-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D187-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D125-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D169-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G81-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G64-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G64-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-08 |
| filingDate |
2016-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5fc198dac001687ed883267af49aba9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee54e4403803c9a1a560614dbb73f546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35a171611f2a9a9ba09b92ba04f6ee3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a2126944a012c740337e2d6639902b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7d5c4699cf06cf3e3d03dd1bb65cad3 |
| publicationDate |
2018-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9982097-B2 |
| titleOfInvention |
Thin film self assembly of topcoat-free silicon-containing diblock copolymers |
| abstract |
A high-chi diblock copolymer (BCP) for self-assembly comprises a first block comprising repeat units of trimethylsilyl styrene (TMSS) and styrene, and a second block comprising an aliphatic carbonate repeat unit. The blocks are linked together by a fluorinated junction group L′ in which none of the fluorines of L′ are covalently bound to an atomic center of the polymer backbone. A top-coat free film layer comprising the BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented lamellar domain pattern on an underlayer that is preferential or non-preferential to the domains of the block copolymer. The domain pattern can be selectively etched to provide a relief pattern comprising a remaining domain. The relief pattern having good critical dimensional uniformity compared to an otherwise identical polymer lacking the silicon. |
| priorityDate |
2016-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |